INDIAN ORIGIN SCIENTIST AWARDED FINLAND UNIVERSITY’S HIGHEST SCIENCE HONOUR
For
her outstanding research in the area of materials chemistry as applied to the
field of Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD),
Indian Origin Scientist, Professor Anjana
Devi, Inorganic Materials Chemistry, Ruhr University
Bochum, Germany, is one of the recipients of an Honorary Doctorate in Technology for 2020, from Finland’s Aalto University, according to
the University
news.
An
honorary doctorate is the highest honor the University can award. Professor
Anjana Devi is the youngest recipient from amongst this year’s four other awardees.
PROFESSOR Dr. ANJANA DEVI – RUHR UNIVERSITY
Photo by Sharath Ahuja
PROFESSOR ANJANA DEVI
In
2018, Prof Anjana Devi and her students Nils Boysen from the Ruhr University,
Bochum in collaboration with the group of Professor Thomas Riedl from the Chair
of Electronic Devices, University of Wuppertal, reported a new fabrication
process for transparent ultra-thin silver films.
Second from Left: Nils Boysen with Prof Anjana
Devi
Photo by Sharath Ahuja
They said,
“This constitutes a first step towards the production of novel transparent electrodes
for highly efficient solar cells and lights”. This is one example of the
brilliant research work from GROUP DEVI,
Professor Anjana Devi’s laboratory at the Inorganic Chemistry Division, Ruhr University, Bochum, Germany.
CAREER:
Anjana
Devi graduated with an M.Sc from Mangalore University and a PhD from the Indian
Institute of Science (IISc), Bangalore and then went on to do a Post-Doctoral
Fellowship awarded by the Alexander von Humboldt (AvH) Foundation in 1998. She began her career under Prof Roland A
Fischer, Inorganic Materials Chemistry Division, Ruhr University, Bochum, Germany,
where she is currently Professor and Group Leader.
PROF ANJANA DEVI – INORGANIC MATERIALS
CHEMISTRY – RUHR UNIVERSITY
Photo by Sharath Ahuja
In
a glittering career of two decades and more at the Inorganic
Materials Chemistry Department, Ruhr
University, Prof Anjana Devi has carried out pioneering work in research areas
encompassing: Precursor development – Metal organic Chemical Vapor Deposition
(MOCVD) as a precursor for deposition of thin films using Atomic Layer
Deposition (ALD) and Chemical Vapor Deposition (CVD) techniques. The main focus
of her research is on the transformation of metalorganic precursors into
nanostructured thin films of various functional materials for device
manufacturing and eventual applications as - photo anodes; transparent
electrodes, thin film transistors (TFTs) and transparent conducting thin films
for solar cell applications, sensors, optoelectronics, etc.
AWARDS/PUBLICATIONS/THESES:
SCIENTIFIC PUBLICATIONS ON THE COVER PAGES OF
PRESTIGIOUS INTERNATIONAL JOURNALS
COURTESY: ANJANA DEVI
HOMEPAGE
Prof
Anjana Devi and her group collaborate with scientists from various disciplines,
be they, Physicists, Chemists or Engineers and their goal is to develop
nanostructured materials for different applications ranging from –
Microelectronics, Sensors, Dielectrics, barrier coatings, catalysis and much
more.
Publishing
her research work in international high impact scientific journals, Prof Anjana
Devi has notched up over 190 papers and counting.
She
has graduated in all, Twenty Two (22) B.Sc Students, Thirty Three (33) M.Sc
Students and Seventeen (18) Ph.D students in her career so far.
Besides,
the Best invention Prize – 2005, she received from her University, she is the
recipient of numerous other awards and has been on the editorial board of
several prestigious scientific journals. Prof Anjana is on the international advisory board of the ALD and CVD
community and has led several National and International research projects.
On
being conferred the Honorary Doctorate in Technology -2020 by the prestigious
Aalto University, Finland, Prof Anjana Devi in all humility says, “Hard work always pays off….”. That is
probably her mantra for success.
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Write Up by SHARATH AHUJA
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